In March 2019, Silintech successfully completed the original chip Process analysis laboratory transformation and expansion, improve the overall chip process analysis capabilities.

For the chip process Analysis project, to create a closed ultra-clean space, and the maximum allowable number of dust particles in the air strictly controlled within a certain range, can effectively control the chip exposure to the air cleanliness and temperature and humidity, reduce the chip photography caused by unnecessary pollution. At the same time help to eliminate electrostatic and electromagnetic interference, improve the etching effect of the equipment.

Currently Silintech Have enough technical strength and equipment energy to undertake 10nm The process analysis and circuit competitiveness analysis of various types of chips above. In the ultra-clean dust-free laboratory, has been invested in sem/om,ICP,RIE, IBE,RIBE,CMP and many other advanced equipment, insight into cutting-edge technology, to provide customers with high-quality technical services.

                                                                                                                                                                             10nm M1

With the continuous reduction of chip process nodes, chip process analysis is also faced with more technical realization difficulties,Silintech and constantly upgrade experimental equipment, in order to meet the future of smaller process process analysis to do a good job in preparation.